Tetrasilane is a silane with the structure formula SiH3–(SiH2)2–SiH3. It is the silane analog of butane.
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IUPAC name
Tetrasilane
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Other names
n-Tetrasilane
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ECHA InfoCard | 100.132.456 |
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CompTox Dashboard (EPA)
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Properties | |
H10Si4 | |
Molar mass | 122.420 g·mol−1 |
Appearance | colourless liquid that self ignite in air[1] |
Density | 0.792 g·cm−3[2] |
Melting point | −89.9 °C[2] |
Boiling point | 108.1 °C[2] |
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H250 | |
Related compounds | |
Related compounds
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butane |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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Tetrasilane can be prepared by reacting magnesium silicide (Mg2Si) with acids like 20% phosphoric acid in 50–60 °C.[3]
The reaction can produce silanes up to n=15. The reaction of magnesium silicide with 25% hydrochloric acid produces 40% monosilane, 30% disilane, 15% trisilane, 10% tetrasilane and 5% higher silanes.[4] The mixture can be separated by fractional distillation.
In addition, higher silanes can also be obtained by discharges monosilane:[3]
Tetrasilane is a colourless, pyrophoric liquid that has a disgusting odour. Even below 54 °C, it will still spontaneous combust.[1] It is even more unstable than trisilane, slowly decomposing at room temperature, releasing hydrogen and forming shorter chain silanes.[5]
Photochemical disproportionation of tetrasilane will produce 3-silylpentasilane and disilane.[6]
With the presence of aluminium chloride, heating tetrasilane in xylene will allow isomerization to isotetrasilane.[7]