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Tribromosilane

Summary

Tribromosilane is the chemical compound with the formula HBr3Si.[1] At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry.

Tribromosilane
Names
IUPAC name
Tribromosilane
Other names
Silicobromoform; Tribromomonosilane
Identifiers
  • 7789-57-3 checkY
3D model (JSmol)
  • Interactive image
ChemSpider
  • 74222
ECHA InfoCard 100.029.250 Edit this at Wikidata
  • 82244
UNII
  • H5DT3G5DA3 checkY
  • DTXSID50160668 Edit this at Wikidata
  • InChI=1S/Br3HSi/c1-4(2)3/h4H
  • Br[SiH](Br)Br
Properties
Br3HSi
Molar mass 268.805 g·mol−1
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Infobox references

The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon, but it has a number of cost and safety advantages over the Siemens Process to make polysilicon.[2]

It may be prepared by heating crystalline silicon with gaseous hydrogen bromide at high temperature.[3] It spontaneously combusts when exposed to air.[4]

References edit

  1. ^ PubChem. "Tribromosilane". pubchem.ncbi.nlm.nih.gov. Retrieved 2022-12-22.
  2. ^ The Schumacher Process
  3. ^ Schumb WC, Young RC (April 1930). "A study of the reaction of hydrogen bromide with silicon". Journal of the American Chemical Society. 52 (4): 1464–1469. doi:10.1021/ja01367a025.
  4. ^ Schumb WC (December 1942). "The Halides and Oxyhalides of Silicon". Chemical Reviews. 31 (3): 587–595. doi:10.1021/cr60100a004.